New IFN logo fabricated using Electron Beam Lithography
The IFN has developed a new version of its nano logo. This new logo was fabricated using Electron Beam Lithography acting on a polymeric film of polymethylmethacrylate by Dr. Ruben Diaz, one of our IFN members. The narrowest line has a width of about 40nm and the letter size is about 140nm. The IFN will start using this logo for special presentations to demonstrate its capacity to fabricate nano structures.
